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翻訳と辞書　辞書検索 [ 開発暫定版 ] スポンサード リンク Ion-beam sculpting ： ウィキペディア英語版 Ion-beam sculpting Ion-Beam sculpting is a two-step process to make solid-state nanopores. The term itself was coined by Golovchenko and co-workers at Harvard in the paper "Ion-beam sculpting at nanometer length scales." 〔J. Li, D. Stein, C. McMullan, D. Branton, M.J. Aziz, and J.A. Golovchenko, Nature, 412, 166 (2001) ()〕 In the process, solid-state nanopores are formed by lateral mass transport about the surface of the substrate, not simply by sputtering, which is the removal of material from the surface. ==Basis== The first step in ion sculpting is to make either a through hole or a blind hole, most commonly using an focused ion beam (FIB). The holes are commonly ~100 nm, but can be made much smaller. This step may or may not be done at room temperature, with a low temperature of -120 C. Next, there are three common techniques to now 'sculpt' the hole: broad area ion exposure, TEM exposure, and FIB exposure. Holes can be closed completely, but also they can be left open at a lower limit of 1 - 10 nm. 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Ion-beam sculpting」の詳細全文を読む スポンサード リンク 翻訳と辞書 : 翻訳のためのインターネットリソース Copyright(C) kotoba.ne.jp 1997-2016. All Rights Reserved.